Jérôme CHARLIAC

Article dans une revue

ref_biblio

Ralph El Hage, Vincent Humbert, Victor Rouco, Gabriel Sánchez-Santolino, Aurelien Lagarrigue, et al.. Bimodal ionic photomemristor based on a high-temperature oxide superconductor/semiconductor junction. Nature Communications, 2023, 14 (1), pp.3010. ⟨10.1038/s41467-023-38608-0⟩. ⟨hal-04284618⟩

Accès au bibtex

ref_biblio

Laurence Bodelot, Luka Pavic, Simon Hallais, Jérôme Charliac, Bérengère Lebental. Aggregate-driven reconfigurations of carbon nanotubes in thin networks under strain: in-situ characterization. Scientific Reports, 2019, 11p. ⟨10.1038/s41598-019-41989-2⟩. ⟨hal-03241026⟩

Accès au texte intégral et bibtex

ref_biblio

P. Leempoel, P. Descamps, T. Kervyn de Meerendré, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. Thin Solid Films, 2008, 516, pp.6853. ⟨hal-00350890⟩

Accès au bibtex

ref_biblio

P. Roca I Cabarrocas, Pavel Bulkin, D. Daineka, T. H. Dao, P. Leempoel, et al.. Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance. Thin Solid Films, 2008, pp.6834-6838. ⟨hal-00915445⟩

Accès au bibtex

Communication dans un congrès

ref_biblio

Cassiano Tecchio, Xiaolong Zhang, B. Cariteau, Gilbert Zalczer, Pere Roca I Cabarrocas, et al.. Microlayer dynamics at bubble growth in boiling. 16th International. Conference on Heat Transfer Fluid Mechanics and Thermodynamics (HEFAT-ATE 2022), Aug 2022, Virtual, France. pp.624-629. ⟨cea-04506433⟩

Accès au bibtex

ref_biblio

Laurence Bodelot, Jérôme Charliac, Simon Hallais, Bérengère Lebental, Luka Pavic, et al.. In-situ investigation of local motion mechanisms in carbon nanotubes strain sensors. C'NANO 2017, The Nanoscience Meeting, Dec 2017, Lyon, France. 26p. ⟨hal-01812099⟩

Accès au bibtex

ref_biblio

P. Leempoel, P. Descamps, T. Kervyn de Meerenedre, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. E-MRS 2007 Spring Meeting, 2007, France. ⟨hal-00322305⟩

Accès au bibtex